etching的意思、解釋

  復數形式：etchings;

名詞蝕刻版畫

動詞用針和酸類在金屬板上蝕刻（圖畫等）( etch的現在分詞 ); （感情）明顯地表露在（臉上）; （臉上）明顯流露出（感情）; 銘刻在心里/記憶里/腦海里

etching

名詞

1. His etchings and drawings never went out of fashion.

他的蝕刻畫和素描從不過時。

2. That is a beautiful etching of a bird.

那是一只鳥的漂亮的蝕刻畫。

1. 腐蝕：(6)腐蝕 (etching) 經過上述工序后,以復制到光刻膠上的集成電路的圖形作為掩模,對下層的材料進行腐蝕. 腐蝕技術是利用化學腐蝕法把材料的某一部分去除的技術. 腐蝕技術分為兩大類:濕法腐蝕-進行腐蝕的化學物質是溶液;

2. etching的近義詞

2. 蝕刻術：之后,利用蝕刻術(Etching)將RFID標簽之天線以螺旋方式盤繞于圓環銅片上,再將此元件放置于附有圓孔之塑膠盤上;其次,再將此裝有RFID標簽天線之塑膠盤放置于尚未凝結之混凝土試體頂端.

3. etching的反義詞

3. 蝕刻法：1.先以濺鍍法(sputter)在蘇打石玻璃(soda line glass)制作Al等膜層,再用蝕刻法(etching)制作圖樣(pattern). 上述第1與第4項之流程系使用現有的成膜技術與材料;第2與第3項則為松下公司開發的多孔化PPS技術.

1. etching

1. An infrared thermalimage method which is used to study the wet etching process of semiconductor is proposed.

提出了一種研究半導體濕法腐蝕進程的紅外熱像法。

2. At the same time, the preparation and micro-pattern etching techniques of PZT thin films are investigated by experiment.

對PZT壓電薄膜的制備和微細圖形化進行了較為詳細的實驗研究，最后成功地制備出硅基PZT壓電薄膜微傳感器樣品。

3. They are in a normal lithography processing steps is completed, using chemical etching method in place of the commonly used dry etching process, which quickly transferred to the required micro-pattern on the porous anodic aluminum oxide film.

他們在正常的光刻加工步驟完成后，利用化學刻蝕方法代替通常采用的干法刻蝕工藝，從而快速地將所需的微觀圖案轉移到多孔陽極氧化鋁片上。

4. etching的反義詞

4. In the process of the micro-pattern fabrication, we utilized technology of shallow etching process effectively, that succeeded in reducing the leaked electric currents between mesa and gates.

在樣品制作過程中，我們利用淺式蝕刻的技術，成功地降低樣品與閘極之間的漏電流。

5. Moreover, the micro-pattern etching of electrodes and PZT thin films have been investigated, and the fast and successful etchings have been actualized with new etchants and original methods. The technics and mechanism of anisotropic etching of monocrystalline silicon have been studied deeply, for example the influences of the concentration and temperature of tetramethyl ammonium hydroxide on the rate and effect of the anisotropic etching.

此外，結合PZT鐵電薄膜熱釋電單元紅外探測器的設計和制備，對電極和PZT鐵電薄膜的微圖形刻蝕工藝進行了研究，采用新的刻蝕液配方和具有獨創性的方法，實現了對PZT鐵電薄膜和上下電極快速、成功的刻蝕。

6. etching

6. These emitting electrodes are a result of etching process instead of acid pickling, and are hence even reliable.

這些發射極是刻出的，不是酸洗的，因此器件更可靠。

7.

7. Theoretically, the experimental formula of ion beam etching rate has been corrected, as a result the application field is extended.

內容簡述如下：理論方面：修正了傳統的離子束濺射刻蝕速率的經驗公式，擴展了它的適用范圍。

8. Etching of graphical elements on silicon wafer has been proceeded, and the influence of experimental parameters on etching is analysed.

研究了FIB刻蝕中束斑漂移的影響和套準的作用，并在硅片上對各種圖形元素的刻蝕進行了嘗試，研究了刻蝕條件對結果的影響。

9. etching什么意思

9. HgCdTe p + on n hetero junction material was grown by molecular beam epitaxy and in situ doping, and HgCdTe p + on n hetero junction infrared focal plane arrays were fabricated by the process of wet etching, side wall passivation, side wall matelization, indium bump fabrication and hybridization etc.

采用由分子束外延和原位摻雜技術生長的p+-on-n異質結材料，通過濕法腐蝕、臺面鈍化、臺面金屬化、銦柱制備和互連等工藝，得到了HgCdTe p+-on-n長波異質結焦平面器件。

10. The effects of etching condition on the pore shape and pore size were also investigated.

在蝕刻后的樣品表面鍍金屬膜，對鍍膜后樣品的抗金屬污染的絕緣性能進行了研究。

11. A Fe-Al2O3 composite plating deposit was obtained based on non-etching iron dichloride iron plating process with addition of Al2O3 inert particles in ferrous chloride single salt solution (ferrous chloride concentration of 300~400 g/L) with no need of etching technology.

以二氯化鐵無刻蝕電鍍工藝為基礎，在氯化亞鐵單鹽(ρ=300~400g/L)中加入Al2O3惰性粒子，制備了 Fe–Al2O3復合鍍層。

12. Laser etching were tested on a silicon workpiece both in air and under water.

在實驗的基礎上，研究了兩種介質中準分子激光刻蝕S i的刻蝕孔的基本形貌和刻蝕速率，并對結果進行了對比分析。

13. etching什么意思

13. As well as rock painting and etching, Australian Aboriginals have a long tradition of making and decorating artefacts.

與巖畫和蝕刻版畫一樣，澳洲土著擁有相當悠久的制造和裝飾人工制品的傳統。

14. Resistance pure water system, 3-waste treatment system, and shock-proof working-table, and about 80 sets of micro-electrical-mechanical technical equipment are installed, including AMS200 ICP plasma etching system, ICP-2B etching machine, AWB04 bonding machine, MA6/BA6 Karlsus double-face photolithography machine/bonding machine, POLI-400 chemical-mechanical-polishing tool, WL2040 aluminum-wire press welder, OPTI CAOT 22i decktop precision spin coasting system, ZSH406 automatic dicing saw system, DQ-500 plasma photoresist-removing machine, HXS150S automatic centrifugal spinner, AXTRON MOCVD metal organic chemical vapor deposit system, 4470 micro-control 4-tube diffusing furnace, type 4371 LPCVD low pressure chemical vapor deposit system, OMICRON MBE molecular beam epitaxy system, JS-3X100B magnet-control spattering equipment, PECVD-2E plasma deposit apparatus, ZZSX500C electron-beam vapor equipment, JC500-3/D magnet-control spattering-coating machine, H63-14/ZM quartz-tube cleaning machine. Measurement instruments include OLS1100 Confocal Laser Scanning Microscope, DEKTAKIII Surface Profiler, D41-11A/ZN 4-probe resistance test instrument, Nikon L150 metallurgical microscope, and so on.

中心現有80多臺各種微機電工藝設備，如AMS 200深硅等離子體刻蝕系統、ICP-2B刻蝕機、AWB04鍵合機、MA6/BA6 Karlsuss雙面光刻機和鍵合機、POLI-400化學機械拋光機、WL2040鋁絲壓焊機、OPTI CAOT 22i噴涂膠機系統、ZSH406全自動劃片機、DQ-500等離子去膠機、全自動清洗甩干機、AXTRON MOCVD金屬有機物化學氣相沉積系統、4470微控四管擴散爐、4371LPCVD低壓化學沉積系統、OMICRON分子束外延系統、JS-3X100B磁控濺射臺、PECVD-2E等離子淀積臺、ZZSX500C電子束蒸發臺、JC500-3/D磁控濺射鍍膜機、石英管清洗機，以及多種常用測試儀器，如OLS1100激光共聚焦顯微鏡、DEKTAK-III臺階測量儀、D41-11A/ZN四探針電阻測試儀、Nikon L150金相顯微鏡等。

15. The key technologies in the fabrication process including the deep heavy p+ doping technology, low stress silicon nitride film technology and body silicon etching technology were studied.

針對電容式微傳聲器制備過程中的關鍵工藝，做了詳實細致的研究工作，包括高濃度深硼擴散工藝研究、低應力氮化硅薄膜的生長研究和體硅腐蝕工藝的研究，在工藝方面為電容式微傳聲器的制備打下了基礎。

16. Based on the observation of atomic force microscopy, the etching morphology of faces and sections with different crystallographic significance on α-quartz has been studied. The etching morphology on the natural crystal faces hexagonal prism faces (1010 and 01(average10, rhombohedron positive form face 10(average11, rhombohedron negative form face 01(average11 and the sections between any of the two crystal faces has been observed. It is shown that the etching pit on the same simple form has the same shape, while the orientation of the etching pits can be different. Different simple forms have different shapes of etching pits and the shapes of etching pits on positive form and negative form of the same simple form are also different.

通過對α-石英自然晶面六方柱面10(平均值10和01(平均值10、菱面體正形面10(平均值11與菱面體負形面01(平均值11、以及介于上述自然晶面之間的切面進行腐蝕形貌的觀察研究發現，石英晶體同種單形的晶面腐蝕坑形態相同，但方位可以有變化，不同單形的晶面腐蝕坑形態不同；同一單形的正形與負形腐蝕坑形狀不同；蝕坑形態能夠反映晶體的對稱性。

17. etching

17. From this research, we prove the property of nano-scale etching with CPAWE and it can be used to fabricate a nano scale light emission device.

從本研究中，我們驗證了間歇光輔助濕蝕刻的方式在奈米等級結構蝕刻的特性，并且確信其能應用在奈米級發光元件的制作上。

18. etching

18. You are also on this basis and frosting and etching.

還可在此基礎上磨砂和蒙砂。

19. A hierarchical roughness was fabricated on H62 brass surface by chemical etching with a FeCl3-HCl-H2O solution. The roughness consisted of terrace-like sidestep and etch pit with average pore diameter varied from 6.2 to 8.3μm.

采用三氯化鐵和鹽酸溶液刻蝕H62黃銅表面，得到了一層由梯田狀臺階結構及平均孔徑為6.2-8.3μm的蝕坑組成的階層結構。

20. The major comment in the paper is TFT-LCD slimming production about chemical etching, figure of product, reliability of product etc.

文章主要探討了TFT-LCD薄板化生產，包括化學蝕刻方式、產品的性質，產品的可靠性項目等。

1. 蝕刻版畫

An etching is a picture printed from a metal plate that has had a design cut into it with acid.

1. The torch is of a curved surface form, with etching and anodizing being used during its production.

2. Rogers'team uses a special etching method that slices chips off the surface of a bulk silicon wafer.

noun

1. making engraved or etched plates and printing designs from them

Synonym: engraving

2. an etched plate made with the use of acid

3. an impression made from an etched plate